Events

Chemical Seminar

CIRS is to Attend Electrical and Electronic Equipment and the Environment Conference 2017

Time : 1 November 2017
Location : London, UK
Lang. : EN
Cost : Refer to EEE conference web
On November 1st, Ms. Laura Ho, the operations Manager of C&K Testing (CIRS laboratory), was invited to give the presentation on the Status of China RoHS 2.0 & China REACH in EEE conference held in London, UK. Welcome to meet with us if you also attend this conference.
Chemical Seminar

US Workshop - Chemical Regulations in China, Korea and EU

Time : 14 September 2017
Location : DoubleTree by Hilton Washington DC
Lang. : EN
Cost : Free
CIRS will sponsor the US Free Workshop in Washington DC on 14 Sep. China chemical regulations, K-REACH, EU REACH and China GHS will be interpreted in this workshop.
Chemical Seminar

CIRS is to Attend Workshop of Global Chemical Management in Moscow Russia

Time : 18 May 2017
Location : Moscow, Russia
Lang. : EN
Cost : Refer to Workshop Web
Mr. Eric Xiong and Mr. Bryan Zhou will attend Workshop of Global Chemical Management held on May 18th-19th at Room “Moscow”, Sheraton Palace, Hotel, 1stTverskaya-Yamskaya Street 19, Moscow, Russia. Welcome to meet with us during the workshop.
Chemical Seminar

CIRS REACH Regulation Seminar Tours in 2017

Time : 24 March 2017
Location : Nanjing, Shijiazhaung, Qingdao, Tianjing, Wuhan, Guangzhou, Chengdu
Lang. : CN
Cost : Free
The deadline of REACH late pre-registration is just around the corner and the pre-registration number will be invalid after 31 May 2018. In order to help company to understand EU REACH and other similar regulations better, CIRS will hold REACH Regulation Seminar Tours in 2017 from March to May.
Chemical Seminar

CIRS will Give a Speech for Regulatory Compliance Forum 2016

Time : 1 November 2016
Location : Pittsburgh, USA
Lang. : EN
Cost : Refer to 3E Web
CIRS, as the partner sponsor of this forum, will give presentation on Chemical Management in China—Overview and Best Practice Advice during 10:45-11:15. Please meet with us if you also attend this conference.